Resist processing equipment
Spin Coater TCS
TCS series spin coater is designed for R&D and small scale production in MEMS, Semiconductor, PV, Microfluidics. TCS spin coaters can process a wide range of round wafers starting from pieces up to 150 mm or square substrates up to 125x125mm. It has lot of options available and can perfectly match your requirements.
Semiautomatic Spin Coater & Developer LCS
LCS is designed for semiautomatic spin coating, developing and etching wafers or square substrates in R&D and small scale production and have following features: